Lam Research Unveils Groundbreaking Plasma Etching Technology for Semiconductor Manufacturing
In a significant advancement for the semiconductor industry, Lam Research, a U.S.-based manufacturer of semiconductor fabrication equipment, has launched a new product capable of producing complex circuits essential for future electronic applications, particularly in artificial intelligence (AI). This innovation, named DirectDrive®, originated in a UCLA lab through a collaboration funded by the National Science Foundation (NSF).
DirectDrive® enhances plasma etching precision, enabling the creation of smaller, denser, and three-dimensional semiconductors with angstrom-level accuracy. "To support AI-driven consumer electronics, next-gen semiconductor architectures demand unparalleled plasma etching capabilities," stated Alex Paterson, corporate vice president for etch products at Lam Research.
The initiative traces back to 2006 when UCLA engineer Patrick Pribyl developed a prototype for controlling plasma etching in his kitchen. His concept gained traction in 2015 with the support of NSF’s Grant Opportunities for Academic Liaison with Industry (GOALI) program, which fosters collaboration between academia and industry.
Working alongside physicist Walter Gekelman, Pribyl modified Lam’s industrial plasma etching machine to harness the benefits of pulsed plasma technology. The results defied expectations, drawing astonishment from industry experts who initially deemed the advancements impossible.
The core of the DirectDrive® innovation lies in its ability to rapidly switch radio frequency (RF) energy, thus controlling plasma more effectively. This swift modulation allows for significant reductions in etching times and improved precision, vital for the ever-evolving demands of semiconductor technologies.
The journey from research to application has been meticulous, with years dedicated to experiments and understanding plasma dynamics. As the semiconductor landscape continues to evolve, Lam Research’s DirectDrive® stands as a testament to the power of collaborative innovation, reinforcing the critical connection between academia and industry in driving technological progress.
Source
Photo credit www.nsf.gov
